Tin Sulfide Sputtering Target

Tin Sulfide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tin Sulfide Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
Tin Sulfide Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
Tin Sulfide Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
Tin Sulfide Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
Tin Sulfide Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
Tin Sulfide Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
Tin Sulfide Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

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Tin sulfide is a chemical compound of tin and sulfur. The chemical formula is SnS. The density is 5.22 g/cm3. The melting point is 882 °C.

Tin sulfide sputtering target is a kind of high purity tin sulfide raw material by sputtering deposition. According to the different shapes, tin sulfide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tin sulfide targets. Tin sulfide is an interesting potential candidate for next generation thin-film solar cells. It has a high optical absorption coefficient, p-type conductivity, and a mid range direct band gap of 1.3-1.4 eV. At present, tin sulfide thin films can be used in photovoltaic cells.

Tin Sulfide Sputtering Target Application

High purity tin sulfide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.