Titanium Carbide Sputtering Target

Titanium Carbide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Titanium Carbide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Carbide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Carbide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Carbide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Titanium Carbide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Titanium Carbide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Titanium Carbide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Titanium carbide is a kind of metallic cubic lattice solid with gray appearance. The chemical formula is TiC and the molecular weight is 59.89. The melting point is 3160 ℃, the boiling point is 4820 ℃, and the relative density is 4.93. The hardness is greater than 9. Titanium carbide is insoluble in water, but soluble in nitric acid and aqua regia.

Titanium carbide sputtering target is a kind of high purity titanium carbide raw material by sputtering deposition. According to the different shapes, titanium carbide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) titanium carbide targets. Titanium carbide can be used to make hard alloy, semiconductor wear-resistant film, as well as electrode and abrasive of arc lamp.

Titanium Carbide Sputtering Target Application

Titanium carbide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.