Titanium Copper Alloy Sputtering Target (Ti-Cu)

Titanium Copper Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Titanium Copper Alloy Sputtering Target	Circular	99.5%	0 - 48	≥ 1
Titanium Copper Alloy Sputtering Target	Rectangular	99.5%	0 - 48	≥ 1
Titanium Copper Alloy Sputtering Target	Annular	99.5%	0 - 48	≥ 1
Titanium Copper Alloy Sputtering Target	Oval	99.5%	0 - 48	≥ 1
Titanium Copper Alloy Sputtering Target	Cylindrical	99.5%	0 - 48	≥ 1
Titanium Copper Alloy Sputtering Target	Planar	99.5%	0 - 48	≥ 1
Titanium Copper Alloy Sputtering Target	Rotatable (rotary)	99.5%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Titanium copper alloy sputtering target is a kind of binary alloy sputtering target made of high-purity metal titanium powder and metal copper powder in a certain proportion. After the titanium copper alloy sputtering target is made into a blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, titanium copper alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. titanium copper alloy targets. We can customize titanium copper alloy sputtering targets with different shapes according to customers' requirements, or we can customize targets with different titanium copper alloy compositions according to customers' chemical composition requirements.

Titanium Copper Alloy Sputtering Target Application

Titanium copper alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing titanium copper alloy films.