Titanium Silicon Alloy Sputtering Target (Ti-Si)

Titanium Silicon Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Titanium Silicon Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Titanium Silicon Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Titanium Silicon Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Titanium Silicon Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Titanium Silicon Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Titanium Silicon Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Titanium Silicon Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Titanium silicon alloy sputtering target is a kind of binary alloy sputtering target made of high-purity titanium powder and silicon powder in a certain proportion. After the titanium silicon alloy sputtering target is made into a titanium silicon alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, titanium silicon alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. titanium silicon alloy targets. We can customize titanium silicon alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Titanium Silicon Alloy Sputtering Target Application

Titanium silicon alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing titanium silicon alloy films.