Tungsten Disilicide Sputtering Target

Tungsten Disilicide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tungsten Disilicide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Tungsten Disilicide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Tungsten Disilicide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Tungsten Disilicide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Tungsten Disilicide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Tungsten Disilicide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Tungsten Disilicide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Tungsten disilicide is an inorganic compound, a silicide of tungsten. The chemical formula is WSi2. The density is 9.3 g/cm3. The melting point is 2160℃. It is an electrically conductive ceramic material.

Tungsten disilicide sputtering target is a kind of high purity tungsten disilicide raw material by sputtering deposition. According to the different shapes, tungsten disilicide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tungsten disilicide targets. Tungsten disilicide can be used in microelectronics as a contact material, microelectromechanical systems, oxidation-resistant coatings.

Tungsten Disilicide Sputtering Target Application

Tungsten disilicide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.