Tungsten Manganese Alloy Sputtering Target (W-Mn)

Tungsten Manganese Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tungsten Manganese Alloy Sputtering Target	Circular	99.5%	0 - 48	≥ 1
Tungsten Manganese Alloy Sputtering Target	Rectangular	99.5%	0 - 48	≥ 1
Tungsten Manganese Alloy Sputtering Target	Annular	99.5%	0 - 48	≥ 1
Tungsten Manganese Alloy Sputtering Target	Oval	99.5%	0 - 48	≥ 1
Tungsten Manganese Alloy Sputtering Target	Cylindrical	99.5%	0 - 48	≥ 1
Tungsten Manganese Alloy Sputtering Target	Planar	99.5%	0 - 48	≥ 1
Tungsten Manganese Alloy Sputtering Target	Rotatable (rotary)	99.5%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Tungsten manganese alloy sputtering target is a kind of binary alloy sputtering target made of high-purity tungsten powder and manganese powder in a certain proportion. After the tungsten manganese alloy sputtering target is made into a tungsten manganese alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, tungsten manganese alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. tungsten manganese alloy targets. We can customize tungsten manganese alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Tungsten Manganese Alloy Sputtering Target Application

Tungsten manganese alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing tungsten manganese alloy films.