Tungsten Nickel Iron Alloy Sputtering Target (W-Ni-Fe)

Tungsten Nickel Iron Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tungsten Nickel Iron Alloy Sputtering Target	Circular	99.5%	0 - 48	≥ 1
Tungsten Nickel Iron Alloy Sputtering Target	Rectangular	99.5%	0 - 48	≥ 1
Tungsten Nickel Iron Alloy Sputtering Target	Annular	99.5%	0 - 48	≥ 1
Tungsten Nickel Iron Alloy Sputtering Target	Oval	99.5%	0 - 48	≥ 1
Tungsten Nickel Iron Alloy Sputtering Target	Cylindrical	99.5%	0 - 48	≥ 1
Tungsten Nickel Iron Alloy Sputtering Target	Planar	99.5%	0 - 48	≥ 1
Tungsten Nickel Iron Alloy Sputtering Target	Rotatable (rotary)	99.5%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Tungsten nickel iron alloy sputtering target is a kind of ternary alloy sputtering target made of high-purity tungsten powder, nickel powder and iron powder in a certain proportion. After the tungsten nickel iron alloy sputtering target is made into a tungsten nickel iron alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, tungsten nickel iron alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. tungsten nickel iron alloy targets. We can customize tungsten nickel iron alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Tungsten Nickel Iron Alloy Sputtering Target Application

Tungsten nickel iron alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing tungsten nickel iron alloy films.