Tungsten Trioxide Sputtering Target

Tungsten Trioxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tungsten Trioxide Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Trioxide Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Trioxide Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Trioxide Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Trioxide Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Trioxide Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
Tungsten Trioxide Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

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Tungsten trioxide is a light yellow oxide powder in appearance. The chemical formula is WO3, the specific gravity is 7.16 g / cm3, the melting point is 1473 ℃, and the boiling point is 1750 ℃. Tungsten trioxide is insoluble in water, soluble in alkali and slightly soluble in acid. Tungsten trioxide can be used to make high melting point alloy and cemented carbide, tungsten wire and fireproof material.

Tungsten trioxide sputtering target is a kind of high purity tungsten trioxide raw material by sputtering deposition. According to the different shapes, tungsten oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tungsten oxide targets. It can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. 

Tungsten Trioxide Sputtering Target Application

High purity tungsten trioxide sputtering targets can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
- Ferroelectric;
- Gate dielectric;
- For CMOS;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.