Vanadium Pentoxide Sputtering Target

Vanadium Pentoxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Vanadium Pentoxide Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
Vanadium Pentoxide Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
Vanadium Pentoxide Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
Vanadium Pentoxide Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
Vanadium Pentoxide Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
Vanadium Pentoxide Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
Vanadium Pentoxide Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

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Vanadium pentoxide is a kind of metallic compound crystalline powder with orange yellow, brick red and reddish brown in appearance. The molecular formula is V2O5, the molecular weight is 182.00 and the boiling point is 1750 ℃. Vanadium pentoxide is slightly soluble in water, insoluble in ethanol, and soluble in strong acid and alkali.

Vanadium pentoxide sputtering target is a kind of vanadium pentoxide raw material by sputtering deposition. According to the different shapes, vanadium pentoxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) vanadium oxide targets. Vanadium pentoxide is widely used in metallurgy, chemical industry and other industries. It is mainly used for smelting ferrovanadium, alloy additives, organic chemical catalyst, chemical reagent, enamel and magnetic materials.

Vanadium Pentoxide Sputtering Target Application

High purity vanadium pentoxide sputtering target can be used in many applications. The details are as follows:
- Ferroelectric;
- Gate Dielectric;
- For CMOS;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.