Yttrium Aluminium Alloy Sputtering Target (Y-Al)

Yttrium Aluminium Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Yttrium Aluminium Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Yttrium Aluminium Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Yttrium Aluminium Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Yttrium Aluminium Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Yttrium Aluminium Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Yttrium Aluminium Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Yttrium Aluminium Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Yttrium aluminium alloy sputtering target is a kind of binary alloy sputtering target made of high-purity yttrium powder and aluminium powder in a certain proportion. After the yttrium aluminium alloy sputtering target is made into a yttrium aluminium alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, yttrium aluminium alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. yttrium aluminium alloy targets. We can customize yttrium aluminium alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Yttrium Aluminium Alloy Sputtering Target Application

Yttrium aluminium alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing yttrium aluminium alloy films.