Zinc Copper Alloy Sputtering Target (Zn-Cu)

Zinc Copper Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Zinc Copper Alloy Sputtering Target	Circular	99.99%	0 - 48	≥ 1
Zinc Copper Alloy Sputtering Target	Rectangular	99.99%	0 - 48	≥ 1
Zinc Copper Alloy Sputtering Target	Annular	99.99%	0 - 48	≥ 1
Zinc Copper Alloy Sputtering Target	Oval	99.99%	0 - 48	≥ 1
Zinc Copper Alloy Sputtering Target	Cylindrical	99.99%	0 - 48	≥ 1
Zinc Copper Alloy Sputtering Target	Planar	99.99%	0 - 48	≥ 1
Zinc Copper Alloy Sputtering Target	Rotatable (rotary)	99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Zinc copper alloy sputtering target is a kind of binary alloy sputtering target made of high-purity zinc powder and copper powder in a certain proportion. After the zinc copper alloy sputtering target is made into a zinc copper alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, zinc copper alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. zinc copper alloy targets. We can customize zinc copper alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Zinc Copper Alloy Sputtering Target Application

Zinc copper alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing zinc copper alloy films.