Zinc Manganese Alloy Sputtering Target (Zn-Mn)

Zinc Manganese Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Zinc Manganese Alloy Sputtering Target	Circular	99.5%	0 - 48	≥ 1
Zinc Manganese Alloy Sputtering Target	Rectangular	99.5%	0 - 48	≥ 1
Zinc Manganese Alloy Sputtering Target	Annular	99.5%	0 - 48	≥ 1
Zinc Manganese Alloy Sputtering Target	Oval	99.5%	0 - 48	≥ 1
Zinc Manganese Alloy Sputtering Target	Cylindrical	99.5%	0 - 48	≥ 1
Zinc Manganese Alloy Sputtering Target	Planar	99.5%	0 - 48	≥ 1
Zinc Manganese Alloy Sputtering Target	Rotatable (rotary)	99.5%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Zinc manganese alloy sputtering target is a kind of binary alloy sputtering target made of high-purity zinc powder and manganese powder in a certain proportion. After the zinc manganese alloy sputtering target is made into a zinc manganese alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, zinc manganese alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. zinc manganese alloy targets. We can customize zinc manganese alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Zinc Manganese Alloy Sputtering Target Application

Zinc manganese alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing zinc manganese alloy films.