Zirconium Carbide Sputtering Target

Zirconium Carbide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Zirconium Carbide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Carbide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Carbide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Carbide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Carbide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Carbide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Carbide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Zirconium carbide is a dark gray cubic crystal with metallic luster. The chemical formula is ZrC. The melting point is 3540 ℃. The boiling point is 5100 ℃. The density is 6.73 g/cm3. Zirconium carbide is insoluble in cold water and hydrochloric acid, but soluble in hydrofluoric acid and hot concentrated sulfuric acid containing nitric acid or hydrogen peroxide.

Zirconium carbide sputtering target is a kind of high purity zirconium carbide raw material by sputtering deposition. According to the different shapes, zirconium carbide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) zirconium carbide targets. Zirconium carbide is a kind of high melting point material with high hardness and excellent high temperature refractory. It can be used as a raw material of solid propellant in rocket motor, alloy steel, zirconium metal and zirconium tetrachloride, and fine ceramic material with a bright future.

Zirconium Carbide Sputtering Target Application

Zirconium carbide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.