Zirconium Nitride Sputtering Target

Zirconium Nitride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Zirconium Nitride Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Nitride Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Nitride Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Nitride Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Nitride Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Nitride Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Zirconium Nitride Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Zirconium nitride is a kind of yellow nitride in appearance. The chemical formula is ZrN. The melting point is 2952 ° C and the density is 7.09g/cm3. Zirconium nitride is insoluble in water, slightly soluble in inorganic acid, and soluble in concentrated sulfuric acid, hydrofluoric acid and aqua regia.

Zirconium nitride sputtering target is a kind of high purity zirconium nitride raw material by sputtering deposition. According to the different shapes, zirconium nitride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) zirconium nitride targets. Zirconium nitride has good wear resistance, oxidation resistance, corrosion resistance and high superconducting critical temperature, so it can be used in superconductors.

Zirconium Nitride Sputtering Target Application

Zirconium nitride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.