Annular Tantalum Sputtering Target

Annular Tantalum Sputtering Target List

Product Name	Purity	Size (inch)	Thickness (mm)
Annular Tantalum Sputtering Target	99.95%	0 - 48	≥ 1
Annular Tantalum Sputtering Target	99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Annular tantalum sputtering target refers to a hollow tantalum target in a ring shape. The annular tantalum target needs to be processed and customized according to customers' requirements.

Annular Tantalum Sputtering Target Application

Annular tantalum sputtering target is a kind of high purity tantalum raw material for sputtered deposition. It can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.  The details as follows:
- Used in semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.