Tungsten Sputtering Target

Tungsten Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tungsten Sputtering Target	Circular	99.95% - 99.999%	0 - 48	≥ 1
Tungsten Sputtering Target	Rectangular	99.95% - 99.999%	0 - 48	≥ 1
Tungsten Sputtering Target	Annular	99.95% - 99.999%	0 - 48	≥ 1
Tungsten Sputtering Target	Oval	99.95% - 99.999%	0 - 48	≥ 1
Tungsten Sputtering Target	Cylindrical	99.95% - 99.999%	0 - 48	≥ 1
Tungsten Sputtering Target	Planar	99.95% - 99.999%	0 - 48	≥ 1
Tungsten Sputtering Target	Rotatable (rotary)	99.95% - 99.999%	0 - 48	≥ 1

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Tungsten is a silvery white lustrous metal. Its chemical element symbol is W, atomic number is 74, relative atomic mass is 183.85, atomic radius is 137 PIM, density is 19.35g/cm3. Tungsten belongs to VIB group of the sixth period (the second long period) in the periodic table of elements. Tungsten has high melting point, high hardness, low vapor pressure, low evaporation rate and stable chemical properties.

Tungsten sputtering target is a kind of high purity tungsten raw material by sputtering deposition. According to the different shapes, tungsten sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tungsten targets. High purity tungsten can be used to manufacture guns, nozzles of rocket propellers, metal cutting blades, drill bits, superhard dies, drawing dies, etc., and can also be used in electronic tube production, radio electronics and X-ray technology.

Tungsten Sputtering Target Application

High purity tungsten sputtering target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.  The details as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.