High Purity Tungsten Sputtering Target

High Purity Tungsten Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Tungsten Sputtering Target	Circular	99.95% - 99.999%	0 - 48	≥ 1
High Purity Tungsten Sputtering Target	Rectangular	99.95% - 99.999%	0 - 48	≥ 1
High Purity Tungsten Sputtering Target	Annular	99.95% - 99.999%	0 - 48	≥ 1
High Purity Tungsten Sputtering Target	Oval	99.95% - 99.999%	0 - 48	≥ 1
High Purity Tungsten Sputtering Target	Cylindrical	99.95% - 99.999%	0 - 48	≥ 1
High Purity Tungsten Sputtering Target	Planar	99.95% - 99.999%	0 - 48	≥ 1
High Purity Tungsten Sputtering Target	Rotatable (rotary)	99.95% - 99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity tungsten sputtering target refers to the high purity tungsten sputtering target with purity over 99%. We mainly provide 3N5 (99.95%) tungsten sputtering target, 4N (99.99%) tungsten sputtering target, 5N (99.999%) tungsten sputtering target and 8N (99.999999%) tungsten sputtering target.

High Purity Tungsten Sputtering Target Application

High purity tungsten sputtering target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.  The details as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.