Cerium Trifluoride Sputtering Target

Cerium Trifluoride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Cerium Trifluoride Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Cerium Trifluoride Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Cerium Trifluoride Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Cerium Trifluoride Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Cerium Trifluoride Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Cerium Trifluoride Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Cerium Trifluoride Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Cerium trifluoride is a kind of fluoride with white powder appearance. The chemical formula is CeF3. The density is 6.16 g/cm3. The melting point is 1460 ℃. The boiling point is 2300 ℃. Under standard conditions, cerium trifluoride is insoluble in water.

Cerium trifluoride sputtering target is a kind of high purity cerium trifluoride raw material by sputtering deposition. According to the different shapes, cerium trifluoride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) cerium trifluoride targets. Cerium trifluoride can be used as high purity chemical and coating material.

Cerium Trifluoride Sputtering Target Application

Cerium trifluoride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.