High Purity Barium Fluoride Sputtering Target

High Purity Barium Fluoride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Barium Fluoride Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Barium Fluoride Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Barium Fluoride Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Barium Fluoride Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
High Purity Barium Fluoride Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
High Purity Barium Fluoride Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
High Purity Barium Fluoride Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity barium fluoride sputtering target refers to the high purity barium fluoride sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity barium fluoride sputtering targets.

High Purity Barium Fluoride Sputtering Target Application

High purity barium fluoride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.