Hafnium Nitride Sputtering Target

Hafnium Nitride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Hafnium Nitride Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Nitride Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Nitride Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Nitride Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Nitride Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Nitride Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Nitride Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Hafnium nitride is a kind of cubic powder with gray in appearance. The chemical formula is HfN. The melting point is 3310 ℃, and the microhardness is 16GPa. Hafnium nitride is quite stable, but it is easy to be corroded by aqua regia, concentrated sulfuric acid and hydrofluoric acid.

Hafnium nitride sputtering target is a kind of high purity hafnium nitride raw material by sputtering deposition. According to the different shapes, hafnium nitride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) hafnium nitride targets. Hafnium nitride is an important component of hafnium alloy.

Hafnium Nitride Sputtering Target Application

Hafnium nitride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.