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High Purity Chromium Nitride Sputtering Target

High Purity Chromium Nitride Sputtering Target

AvailableHigh Purity Chromium Nitride Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: CrN
  • Purity: 99.5% - 99.9%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Chromium Nitride Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Chromium Nitride Sputtering Target Circular 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Chromium Nitride Sputtering Target Rectangular 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Chromium Nitride Sputtering Target Annular 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Chromium Nitride Sputtering Target Oval 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Chromium Nitride Sputtering Target Cylindrical 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Chromium Nitride Sputtering Target Planar 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Chromium Nitride Sputtering Target Rotatable (rotary) 99.5% - 99.9% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity chromium nitride sputtering target refers to the high purity chromium nitride sputtering target with purity over 99%. We mainly provide 2N5 (99.5%) high-purity chromium nitride sputtering targets.

    High Purity Chromium Nitride Sputtering Target Application

    High purity chromium nitride sputtering target can be used in many applications. The details are as follows:
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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