High Purity Hafnium Oxide Sputtering Target

High Purity Hafnium Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Hafnium Oxide Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Hafnium Oxide Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Hafnium Oxide Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Hafnium Oxide Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
High Purity Hafnium Oxide Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
High Purity Hafnium Oxide Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
High Purity Hafnium Oxide Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity hafnium oxide sputtering target refers to the high purity hafnium oxide sputtering target with purity over 99%. We mainly provide 3N5 (99.95%) high-purity hafnium oxide sputtering targets.

High Purity Hafnium Oxide Sputtering Target Application

Hafnium oxide sputtering target can be used in microelectronics. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.