High Purity Iron Sputtering Target

High Purity Iron Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Iron Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Iron Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Iron Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Iron Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
High Purity Iron Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
High Purity Iron Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
High Purity Iron Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity iron sputtering target refers to the high purity iron sputtering target with purity over 99%. We mainly provide 3N (99.9%), 3N5 (99.95%) and 4N (99.99%) high purity iron sputtering targets.

High Purity Iron Sputtering Target Application

High purity iron sputtering target can be used to prepare magnetic recording media, magnetic recording heads, photoelectric devices and magnetic sensors and other components.