Cobalt Sputtering Target

Cobalt Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Cobalt Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
Cobalt Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
Cobalt Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
Cobalt Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
Cobalt Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
Cobalt Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
Cobalt Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

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Cobalt is a kind of metal with silver gray luster. Its melting point is 1493 ℃ and its specific gravity is 8.9. Cobalt is ferromagnetic, hard and brittle. It is similar to iron and nickel in hardness, tensile strength, machinability, thermodynamic properties and electrochemical behavior. When heated to 1150 ℃, its magnetism disappears.

Cobalt sputtering target is a kind of cobalt raw material for sputtering deposition. According to the different shapes, cobalt sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) cobalt targets. High purity cobalt sputtering targets can be widely used in the manufacture of magnetic materials, super alloys, advanced electronic components, magnetic recording materials, magnetic sensor materials, photoelectric materials and other high-tech fields.

Cobalt Sputtering Target Application

The high purity cobalt sputtering target produced by FUSHEL has high permeability. In the process of physical vapor deposition, the target can start arc smoothly and start to use. High purity cobalt sputtering targets can be widely used in the manufacture of magnetic materials, super alloys, advanced electronic components, magnetic recording materials, magnetic sensor materials, photoelectric materials and other high-tech fields.