High Purity Cobalt Sputtering Target

High Purity Cobalt Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Cobalt Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Cobalt Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Cobalt Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Cobalt Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
High Purity Cobalt Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
High Purity Cobalt Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
High Purity Cobalt Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity cobalt sputtering target refers to the high purity cobalt sputtering target with purity over 99%. We mainly provide 3N5 (99.95%) cobalt sputtering target and 4N (99.99%) cobalt sputtering target.

High Purity Cobalt Sputtering Target Application

The high purity cobalt sputtering target produced by FUSHEL has high permeability. In the process of physical vapor deposition, the target can start arc smoothly and start to use. High purity cobalt sputtering targets can be widely used in the manufacture of magnetic materials, super alloys, advanced electronic components, magnetic recording materials, magnetic sensor materials, photoelectric materials and other high-tech fields.