Planar Cobalt Sputtering Target

Planar Cobalt Sputtering Target List

Product Name	Purity	Size (inch)	Thickness (mm)
Planar Cobalt Sputtering Target	99.95%	0 - 48	≥ 1
Planar Cobalt Sputtering Target	99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Planar cobalt sputtering target refers to a flat cobalt target. Generally, it refers to large-sized planar cobalt target.

Planar Cobalt Sputtering Target Application

Planar cobalt sputtering target produced by FUSHEL has high permeability. In the process of physical vapor deposition, the target can start arc smoothly and start to use. High purity cobalt sputtering targets can be widely used in the manufacture of magnetic materials, super alloys, advanced electronic components, magnetic recording materials, magnetic sensor materials, photoelectric materials and other high-tech fields.