High Purity Nickel Sputtering Target

High Purity Nickel Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Nickel Sputtering Target	Circular	99.9% - 99.999%	0 - 48	≥ 1
High Purity Nickel Sputtering Target	Rectangular	99.9% - 99.999%	0 - 48	≥ 1
High Purity Nickel Sputtering Target	Annular	99.9% - 99.999%	0 - 48	≥ 1
High Purity Nickel Sputtering Target	Oval	99.9% - 99.999%	0 - 48	≥ 1
High Purity Nickel Sputtering Target	Cylindrical	99.9% - 99.999%	0 - 48	≥ 1
High Purity Nickel Sputtering Target	Planar	99.9% - 99.999%	0 - 48	≥ 1
High Purity Nickel Sputtering Target	Rotatable (rotary)	99.9% - 99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity nickel sputtering target refers to the high purity nickel sputtering target with purity over 99%. It is mainly used in semiconductor and microelectronics industry. Nickel sputtering target is the key material of semiconductor back electrode. We mainly provide 3N (99.9%), 3N5 (99.95%), 4N (99.99%), 4N5 (99.999%) and 5N (99.999%) high-purity nickel sputtering targets.

High Purity Nickel Sputtering Target Application

High purity nickel sputtering target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Microelectronics industry;
- Optical applications.