High Purity Niobium Sputtering Target

High Purity Niobium Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Niobium Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Niobium Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Niobium Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
High Purity Niobium Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
High Purity Niobium Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
High Purity Niobium Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
High Purity Niobium Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity niobium sputtering target refers to the high purity niobium sputtering target with purity over 99%. We mainly provide 3N5 (99.95%) niobium sputtering targets and 4N (99.99%) niobium sputtering targets.

High Purity Niobium Sputtering Target Application

The high purity niobium sputtering target produced by us has excellent conductivity in the process of physical vapor deposition, and can obtain the film with minimum particles. It can be used in nuclear industry, semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details as belows:
- Nuclear industry
- Semiconductor
- Chemical vapor deposition (CVD) display 
- Physical vapor deposition (PVD) display 
- Optical applications