Niobium Sputtering Target

Niobium Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Niobium Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
Niobium Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
Niobium Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
Niobium Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
Niobium Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
Niobium Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
Niobium Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

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Niobium is a kind of gray white metal with luster. Its melting point is 2468 ℃, its boiling point is 4742 ℃, and its density is 8.57g/cm3. The chemical symbol of niobium is Nb, the atomic number is 41, and the atomic weight is 92.90638. Niobium is paramagnetic.

Niobium sputtering target is a kind of high purity niobium metal raw material used for sputtering deposition coating. According to the different shapes, niobium sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) niobium targets. It has high ductility and hardens with the increase of impurity content. Niobium sputtering target can be used in nuclear industry.

Niobium Sputtering Target Application

The high purity niobium sputtering target produced by us has excellent conductivity in the process of physical vapor deposition, and can obtain the film with minimum particles. It can be used in nuclear industry, semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details as belows:
- Nuclear industry
- Semiconductor
- Chemical vapor deposition (CVD) display 
- Physical vapor deposition (PVD) display 
- Optical applications