High Purity Silicon Dioxide Sputtering Target

High Purity Silicon Dioxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Silicon Dioxide Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Silicon Dioxide Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Silicon Dioxide Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Silicon Dioxide Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
High Purity Silicon Dioxide Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
High Purity Silicon Dioxide Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
High Purity Silicon Dioxide Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity silicon dioxide sputtering target refers to the high purity silicon dioxide sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity silicon dioxide sputtering targets.

High Purity Silicon Dioxide Sputtering Target Application

High purity silicon dioxide sputtering targets can be used for manufacturing glass, quartz glass, water glass, optical fiber, electronic industry, optical instruments, crafts and refractories, and is an important material for scientific research.