Silicon Monoxide Sputtering Target

Silicon Monoxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Silicon Monoxide Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
Silicon Monoxide Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
Silicon Monoxide Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
Silicon Monoxide Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
Silicon Monoxide Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
Silicon Monoxide Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
Silicon Monoxide Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

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Silicon monoxide is an amorphous powder with a black brown to loess in appearance. The chemical formula is SiO, the melting point is 1702 ° C, the boiling point is 1880 ° C, and the density is 2.13g/cm3. Silicon monoxide is difficult to dissolve in water, but can be dissolved in mixed acid of dilute hydrofluoric acid and nitric acid. Silicon monoxide is not stable and will oxidize to silica in the air.

Silicon monoxide sputtering target is a kind of high purity silicon monoxide raw material by sputtering deposition. According to the different shapes, silicon monoxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) silicon monoxide targets. It can be used in the preparation of optical glass, optical instruments and semiconductor materials.

Silicon Monoxide Sputtering Target Application

High purity silicon monoxide sputtering targets can be used as fine ceramic synthetic material, and used as the preparation of optical glass and semiconductor materials; silicon monoxide can also evaporate in vacuum and be coated on the metal reflection mirror used for optical instruments as protective film; silicon monoxide can also be used for the preparation of semiconductor materials.