High Purity Tantalum Disilicide Sputtering Target

High PurityTantalum Disilicide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High PurityTantalum Disilicide Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
High PurityTantalum Disilicide Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
High PurityTantalum Disilicide Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
High PurityTantalum Disilicide Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
High PurityTantalum Disilicide Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
High PurityTantalum Disilicide Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
High PurityTantalum Disilicide Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity tantalum disilicide sputtering target refers to the high purity tantalum disilicide sputtering target with purity over 99%. We mainly provide 3N5 (99.95%) high-purity tantalum disilicide sputtering targets.

High PurityTantalum Disilicide Sputtering Target Application

High purity tantalum disilicide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.