Titanium Disilicide Sputtering Target

Titanium Disilicide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Titanium Disilicide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Disilicide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Disilicide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Disilicide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Titanium Disilicide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Titanium Disilicide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Titanium Disilicide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Titanium disilicide is a kind of silicide with dark gray appearance. The chemical formula is TiSi2. The density is 4.02 g/cm3. The melting point is 1470℃.

Titanium disilicide sputtering target is a kind of high purity titanium disilicide raw material by sputtering deposition. According to the different shapes, titanium disilicide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) titanium disilicide targets. 

Titanium Disilicide Sputtering Target Application

Titanium disilicide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.