High Purity Tantalum Nitride Sputtering Target

High Purity Tantalum Nitride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Tantalum Nitride Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Tantalum Nitride Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Tantalum Nitride Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Tantalum Nitride Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
High Purity Tantalum Nitride Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
High Purity Tantalum Nitride Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
High Purity Tantalum Nitride Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity tantalum nitride sputtering target refers to the high purity tantalum nitride sputtering target with purity over 99%. We mainly provide 2N5 (99.5%) high-purity tantalum nitride sputtering targets.

High Purity Tantalum Nitride Sputtering Target Application

High purity tantalum nitride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.