Titanium Nitride Sputtering Target

Titanium Nitride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Titanium Nitride Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Nitride Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Nitride Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Titanium Nitride Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Titanium Nitride Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Titanium Nitride Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Titanium Nitride Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Titanium nitride is a kind of yellowish brown nitride in appearance. The molecular formula is TiN. The molecular weight is 61.88. Titanium nitride powder is generally yellowish brown, ultrafine tin powder is black, and TiN crystal is golden yellow. The melting point of TiN is 2950 ℃.

Titanium nitride sputtering target is a kind of high purity titanium nitride raw material by sputtering deposition. According to the different shapes, titanium nitride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) titanium nitride targets. Titanium nitride has the characteristics of high melting point, high hardness, good chemical stability, little wetting with metal, high conductivity and superconductivity, which can be used in high temperature structural materials and superconducting materials.

Titanium Nitride Sputtering Target Application

Titanium nitride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.