High Purity Titanium Sputtering Target

High Purity Titanium Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Titanium Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Titanium Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Titanium Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Titanium Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
High Purity Titanium Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
High Purity Titanium Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
High Purity Titanium Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity titanium sputtering target refers to the high purity titanium sputtering target with purity over 99%. We mainly provide 4N (99.99%), 4N5 (99.995%) and 5N (99.999%) high-purity titanium sputtering targets.

High Purity Titanium Sputtering Target Application

High purity titanium sputtering target is mainly used as semiconductor material and getter material in ultra-high vacuum device. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Ultra-high vacuum device;
- Optical applications.