Titanium Sputtering Target

Titanium Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Titanium Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Titanium Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Titanium Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Titanium Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Titanium Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Titanium Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Titanium Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Titanium is a silver white transition metal. The element symbol is Ti, atomic number is 22, density is 4.454g/cm3, melting point is 1668 ℃, boiling point is 3262 ℃. Titanium has the characteristics of light weight, high strength, metallic luster and resistance to wet chlorine corrosion.

Titanium sputtering target is a kind of high purity titanium raw material by sputtering deposition. According to the different shapes, titanium sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) titanium targets. High purity titanium is mainly used as semiconductor material and getter material in ultra-high vacuum device. High purity titanium can be widely used in high vacuum and ultra-high vacuum system because of its gas absorption, especially hydrogen, CH4 and CO2.

Titanium Sputtering Target Application

High purity titanium sputtering target is mainly used as semiconductor material and getter material in ultra-high vacuum device. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Ultra-high vacuum device;
- Optical applications.