High Purity Zirconium Disilicide Sputtering Target (ZrSi2)

High Purity Zirconium Disilicide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Zirconium Disilicide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Zirconium Disilicide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Zirconium Disilicide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Zirconium Disilicide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
High Purity Zirconium Disilicide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
High Purity Zirconium Disilicide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
High Purity Zirconium Disilicide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity zirconium disilicide sputtering target refers to a zirconium disilicide sputtering target with purity more than 99%. We mainly provide 2N5 (99.5%) and 3N (99.9%) high-purity zirconium disilicide sputtering targets.

High Purity Zirconium Disilicide Sputtering Target Application

High purity zirconium disilicide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.