Manganese Tin Alloy Sputtering Target (Mn-Sn)

Manganese Tin Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Manganese Tin Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Manganese Tin Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Manganese Tin Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Manganese Tin Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Manganese Tin Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Manganese Tin Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Manganese Tin Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Manganese tin alloy sputtering target is a kind of manganese tin alloy sputtering target made of high-purity metal manganese powder and metal tin powder in a certain proportion. After the manganese tin alloy sputtering target is made into a blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, manganese tin alloy sputtering targets can be divided into circular manganese tin alloy targets, rectangular manganese tin alloy sputtering targets, cylindrical manganese tin alloy targets and other special shapes.

We can customize manganese tin alloy sputtering targets with different shapes according to customers' requirements, or we can customize targets with different manganese tin alloy compositions according to customers' chemical composition requirements.

Manganese Tin Alloy Sputtering Target Application

Manganese tin alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing manganese tin alloy films;
- Used for electronic device.