Mn3Sn Alloy Sputtering Target

Mn3Sn Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Mn3Sn Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Mn3Sn Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Mn3Sn Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Mn3Sn Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Mn3Sn Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Mn3Sn Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Mn3Sn Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

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Mn3Sn alloy sputtering target is a kind of manganese tin alloy sputtering target made of high-purity metal manganese powder and metal tin powder in a certain proportion. After the Mn3Sn alloy sputtering target is made into a blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

Mn3Sn Alloy Sputtering Target Application

Mn3Sn alloy sputtering target can be used in many applications. The details are as follows:
- Used to prepare nonlinear antiferromagnetic Mn3Sn polycrystalline films;
- Used for electronic device.