Planar Manganese Tin Alloy Sputtering Target (Mn-Sn)

Planar Manganese Tin Alloy Sputtering Target List

Product Name	Purity	Size (inch)	Thickness (mm)
Planar Manganese Tin Alloy Sputtering Target	99.9%	0 - 48	≥ 1

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The planar manganese tin alloy sputtering target is a flat manganese tin alloy target. In general, it refers to large-sized planar manganese tin alloy target.

Planar Manganese Tin Alloy Sputtering Target Application

Planar manganese tin alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing manganese tin alloy films;
- Used for electronic device.