Mn3Ge Alloy Sputtering Target

Mn3Ge Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Mn3Ge Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Mn3Ge Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Mn3Ge Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Mn3Ge Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Mn3Ge Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Mn3Ge Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Mn3Ge Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

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Mn3Ge alloy sputtering target is a kind of binary alloy sputtering target made of high-purity manganese powder and germanium powder in a certain proportion. After the Mn3Ge alloy sputtering target is made into a Mn3Ge alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

Mn3Ge Alloy Sputtering Target Application

Mn3Ge alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing Mn3Ge alloy films.