Nickel Iron Molybdenum Manganese Alloy Sputtering Target (Ni-Fe-Mo-Mn)

Nickel Iron Molybdenum Manganese Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Nickel Iron Molybdenum Manganese Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Nickel Iron Molybdenum Manganese Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Nickel Iron Molybdenum Manganese Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Nickel Iron Molybdenum Manganese Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Nickel Iron Molybdenum Manganese Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Nickel Iron Molybdenum Manganese Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Nickel Iron Molybdenum Manganese Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Nickel iron molybdenum manganese alloy sputtering target is a kind of quaternary alloy sputtering target made of high-purity nickel powder, iron powder, molybdenum powder, and manganese powder in a certain proportion. After the nickel iron molybdenum manganese alloy sputtering target is made into a nickel iron molybdenum manganese alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, nickel iron molybdenum manganese alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. nickel iron molybdenum manganese alloy targets. We can customize nickel iron molybdenum manganese alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Nickel Iron Molybdenum Manganese Alloy Sputtering Target Application

Nickel iron molybdenum manganese alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing nickel iron molybdenum manganese alloy films.