Nickel Oxide Sputtering Target

Nickel Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Nickel Oxide Sputtering Target	Circular	99.9%-99.99%	0 - 48	≥ 1
Nickel Oxide Sputtering Target	Rectangular	99.9%-99.99%	0 - 48	≥ 1
Nickel Oxide Sputtering Target	Annular	99.9%-99.99%	0 - 48	≥ 1
Nickel Oxide Sputtering Target	Oval	99.9%-99.99%	0 - 48	≥ 1
Nickel Oxide Sputtering Target	Cylindrical	99.9%-99.99%	0 - 48	≥ 1
Nickel Oxide Sputtering Target	Planar	99.9%-99.99%	0 - 48	≥ 1
Nickel Oxide Sputtering Target	Rotatable (rotary)	99.9%-99.99%	0 - 48	≥ 1

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Nickel oxide is a green black cubic crystal in appearance and the chemical formula is NiO and the molecular weight is 74.71. Nickel oxide is soluble in acid and ammonia, but insoluble in water. When heated, the color of nickel oxide turns yellow. Nickel oxide can be used in alloy, battery, glass, enamel, ceramics, electronic components, nickel salt and catalyst.

Nickel oxide sputtering target is a kind of high purity nickel oxide raw material by sputtering deposition. According to the different shapes, nickel oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) nickel oxide targets. It can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. 

Nickel Oxide Sputtering Target Application

High purity nickel oxide sputtering targets can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
- Ferroelectric;
- Gate dielectric;
- For CMOS;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.