High Purity Nickel Oxide Sputtering Target

High Purity Nickel Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Nickel Oxide Sputtering Target	Circular	99.9%-99.99%	0 - 48	≥ 1
High Purity Nickel Oxide Sputtering Target	Rectangular	99.9%-99.99%	0 - 48	≥ 1
High Purity Nickel Oxide Sputtering Target	Annular	99.9%-99.99%	0 - 48	≥ 1
High Purity Nickel Oxide Sputtering Target	Oval	99.9%-99.99%	0 - 48	≥ 1
High Purity Nickel Oxide Sputtering Target	Cylindrical	99.9%-99.99%	0 - 48	≥ 1
High Purity Nickel Oxide Sputtering Target	Planar	99.9%-99.99%	0 - 48	≥ 1
High Purity Nickel Oxide Sputtering Target	Rotatable (rotary)	99.9%-99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity nickel oxide sputtering target refers to the high purity nickel oxide sputtering target with purity over 99%. We mainly provide 3N (99.9%) high-purity nickel oxide sputtering targets.

High Purity Nickel Oxide Sputtering Target Application

High purity nickel oxide sputtering targets can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
- Ferroelectric;
- Gate dielectric;
- For CMOS;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.