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Planar Nickel Oxide Sputtering Target

Planar Nickel Oxide Sputtering Target

AvailablePlanar Nickel Oxide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: NiO
  • Purity: 99.9%-99.99%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Planar
  • Ships to: Worldwide
  • Planar Nickel Oxide Sputtering Target List

    Product Name Purity Size (inch) Thickness (mm)
    Planar Nickel Oxide Sputtering Target 99.9% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    Planar nickel oxide sputtering target refers to flat nickel oxide target. It generally refers to large-sized nickel oxide target.

    Planar Nickel Oxide Sputtering Target Application

    Planar nickel oxide sputtering targets can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
    - Ferroelectric;
    - Gate dielectric;
    - For CMOS;
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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