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Planar Tantalum Nitride Sputtering Target

Planar Tantalum Nitride Sputtering Target

AvailablePlanar Tantalum Nitride Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: TaN
  • Purity: 99.5% - 99.9%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Planar
  • Ships to: Worldwide
  • Planar Tantalum Nitride Sputtering Target List

    Product Name Purity Size (inch) Thickness (mm)
    Planar Tantalum Nitride Sputtering Target 99.5% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    The planar tantalum nitride sputtering target refers to the tantalum nitride target in the form of a flat plate. It generally refers to large size tantalum nitride target.

    Planar Tantalum Nitride Sputtering Target Application

    Planar tantalum nitride sputtering target can be used in many applications. The details are as follows:
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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