Tantalum Nitride Sputtering Target

Tantalum Nitride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tantalum Nitride Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Nitride Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Nitride Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Nitride Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Nitride Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Nitride Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Nitride Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Tantalum nitride is a kind of black or yellow green hexagonal crystalline nitride in appearance. The molecular formula is TaN and the molecular weight is 194.95. Tantalum nitride is insoluble in water and acid, but slightly soluble in aqua regia.

Tantalum nitride sputtering target is a kind of high purity tantalum nitride raw material by sputtering deposition. According to the different shapes, tantalum nitride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tantalum nitride targets. Tantalum nitride can be used to make accurate sheet resistance materials, while tantalum nitride resistance can resist the erosion of water vapor. In the process of manufacturing integrated circuits, these films are deposited on the top of the silicon wafer to form thin film surface mount resistors.

Tantalum Nitride Sputtering Target Application

Tantalum nitride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.