Silicon Nitride Sputtering Target

Silicon Nitride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Silicon Nitride Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
Silicon Nitride Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
Silicon Nitride Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
Silicon Nitride Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
Silicon Nitride Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
Silicon Nitride Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
Silicon Nitride Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

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Silicon nitride is a kind of nitride with gray, white or gray white in appearance. The chemical formula is Si3N4. The relative molecular weight is 140.28. The density of Si3N4 prepared by reaction sintering method is 1.8 ~ 2.7g/cm3, and the density of Si3N4 prepared by hot pressing method is 3.12 ~ 3.22g/cm3. Mohs hardness is 9 ~ 9.5, Vickers hardness is about 2200, microhardness is 32630 MPa. The melting point is 1900 ℃ (under pressure). Silicon nitride usually decomposes at about 1900 ℃ under normal pressure. The thermal conductivity of silicon nitride is (2-155) w / (m · K). The coefficient of linear expansion is 2.8 ~ 3.2 × 10-6 / ℃ (20 ~ 1000 ℃).

Silicon nitride sputtering target is a kind of high purity silicon nitride raw material by sputtering deposition. According to the different shapes, silicon nitride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) silicon nitride targets. Silicon nitride is an important structural ceramic material. It has the characteristics of high hardness, lubrication, wear resistance and oxidation resistance at high temperature. It can be used to manufacture bearings, turbine blades, mechanical seal rings, permanent molds and other mechanical components.

Silicon Nitride Sputtering Target Application

Silicon nitride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.