Tantalum Iron Silicon Alloy Sputtering Target (Ta-Fe-Si)

Tantalum Iron Silicon Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tantalum Iron Silicon Alloy Sputtering Target	Circular	99.5%	0 - 48	≥ 1
Tantalum Iron Silicon Alloy Sputtering Target	Rectangular	99.5%	0 - 48	≥ 1
Tantalum Iron Silicon Alloy Sputtering Target	Annular	99.5%	0 - 48	≥ 1
Tantalum Iron Silicon Alloy Sputtering Target	Oval	99.5%	0 - 48	≥ 1
Tantalum Iron Silicon Alloy Sputtering Target	Cylindrical	99.5%	0 - 48	≥ 1
Tantalum Iron Silicon Alloy Sputtering Target	Planar	99.5%	0 - 48	≥ 1
Tantalum Iron Silicon Alloy Sputtering Target	Rotatable (rotary)	99.5%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Tantalum iron silicon alloy sputtering target is a kind of ternary alloy sputtering target made of high-purity tantalum powder, iron powder and silicon powder in a certain proportion. After the tantalum iron silicon alloy sputtering target is made into a tantalum iron silicon alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, tantalum iron silicon alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. tantalum iron silicon alloy targets. We can customize tantalum iron silicon alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Tantalum Iron Silicon Alloy Sputtering Target Application

Tantalum iron silicon alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing tantalum iron silicon alloy films.