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Tantalum Iron Silicon Alloy Sputtering Target (Ta-Fe-Si)

Tantalum Iron Silicon Alloy Sputtering Target (Ta-Fe-Si)

AvailableTantalum Iron Silicon Alloy Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: TaFeSi
  • Purity: 99.5%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • Tantalum Iron Silicon Alloy Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    Tantalum Iron Silicon Alloy Sputtering Target Circular 99.5% 0 - 48 ≥ 1
    Tantalum Iron Silicon Alloy Sputtering Target Rectangular 99.5% 0 - 48 ≥ 1
    Tantalum Iron Silicon Alloy Sputtering Target Annular 99.5% 0 - 48 ≥ 1
    Tantalum Iron Silicon Alloy Sputtering Target Oval 99.5% 0 - 48 ≥ 1
    Tantalum Iron Silicon Alloy Sputtering Target Cylindrical 99.5% 0 - 48 ≥ 1
    Tantalum Iron Silicon Alloy Sputtering Target Planar 99.5% 0 - 48 ≥ 1
    Tantalum Iron Silicon Alloy Sputtering Target Rotatable (rotary) 99.5% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    Tantalum iron silicon alloy sputtering target is a kind of ternary alloy sputtering target made of high-purity tantalum powder, iron powder and silicon powder in a certain proportion. After the tantalum iron silicon alloy sputtering target is made into a tantalum iron silicon alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

    According to different shapes, tantalum iron silicon alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. tantalum iron silicon alloy targets. We can customize tantalum iron silicon alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

    Tantalum Iron Silicon Alloy Sputtering Target Application

    Tantalum iron silicon alloy sputtering target can be used in many applications. The details are as follows:
    - Chemical vapor deposition (CVD);
    - Physical vapor deposition (PVD);
    - Used for preparing tantalum iron silicon alloy films.
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